Betekenis van:
etching

etching
Zelfstandig naamwoord
  • gegraveerde afbeelding
  • making engraved or etched plates and printing designs from them

Synoniemen

Hyperoniemen

Hyponiemen

etching
Zelfstandig naamwoord
  • bepaalde soort plaatdruk
  • making engraved or etched plates and printing designs from them

Synoniemen

Hyperoniemen

Hyponiemen

etching
Zelfstandig naamwoord
  • kunst v.h. graveren
  • making engraved or etched plates and printing designs from them

Synoniemen

Hyperoniemen

Hyponiemen

etching
Zelfstandig naamwoord
    • an impression made from an etched plate

    Hyperoniemen

    Hyponiemen

    etching
    Zelfstandig naamwoord
      • an etched plate made with the use of acid

      Hyperoniemen

      etching
      Zelfstandig naamwoord
      • prentkunst
      • making engraved or etched plates and printing designs from them

      Synoniemen

      Hyperoniemen

      Hyponiemen

      etching
      Zelfstandig naamwoord
      • staalgravure
      • making engraved or etched plates and printing designs from them

      Synoniemen

      Hyperoniemen

      Hyponiemen

      Werkwoord


      Voorbeeldzinnen

      1. Anisotropic plasma dry etching equipment as follows:
      2. of a kind used for high voltage etching [1]
      3. Parts and accessories for apparatus for dry-etching patterns on liquid crystal devices (LCD) substrates
      4. The fusion of the welded metal with the parent metal must be smooth and free from etching.
      5. Other uses are as a pickling Other uses are agent for metal surfaces, an etching agent for glass surfaces and surface cleaning.
      6. "Physics-based" simulation "software" specially designed for the "development" of lithographic, etching or deposition processes for translating masking patterns into specific topographical patterns in conductors, dielectrics or semiconductor materials.
      7. ’Physics-based’ simulation "software" specially designed for the "development" of lithographic, etching or deposition processes for translating masking patterns into specific topographical patterns in conductors, dielectrics or semiconductor materials.
      8. Anisotropic plasma dry etching equipment, as follows: 1. Equipment with cassette-to-cassette operation and load-locks, and having any of the following: a. Designed or optimised to produce critical dimensions of 180 nm or less with ± 5 % 3 sigma precision; or b. Designed for generating less than 0,04 particles/cm2 with a measurable particle size greater than 0,1 μm in diameter;